Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus

US9581910B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Frank Schlesener · Oberkochen, DE
• Ingo Saenger · Heidenheim, DE
• Olaf Dittmann · Bopfingen, DE
• Aksel Goehnermeier · Aalen, DE
• Alexandra Pazidis · Aalen, DE
• Thomas Schicketanz · Aalen, DE
• Michael Patra · Oberkochen, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Jun 23, 2015
• Grant date: Feb 28, 2017
• Expiry date: Jun 23, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70058
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps: