Patent · US Active

Patterning device support, lithographic apparatus, and method of controlling patterning device temperature

US9632433B2 · kind B2 · utility

2Cited by

5References

9Claims

0Family size

Assignees

ASML Holding N.V. · NL
ASML NETHERLANDS B.V. · NL

Inventors

Earl William Ebert · Oxford, US
Johannes Onvlee · 's-Hertogenbosch, NL
Samir Nayfeh · Shrewsbury, US
Mark Josef Schuster · Fairfield, US
Peter A. Delmastro · New Milford, US
Christopher Charles Ward · Somerville, US
Frank Johannes Jacobus Van Boxtel · Eindhoven, NL
Abdullah Alikhan · Wilton, US
Daniel Nathan Burbank · Wilton, US
Daniel N. Galburt · Wilton, US
Justin Matthew Verdirame · Cambridge, US

Key dates

Filing date	Oct 21, 2013
Grant date	Apr 25, 2017
Priority date	—
Expiry date	Jan 12, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70866
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.