Reticle cooling system in a lithographic apparatus
US9632434B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 29, 2015 |
| Grant date | Apr 25, 2017 |
| Priority date | — |
| Expiry date | May 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.