Polishing pad having polishing surface with continuous protrusions
US9649742B2 · kind B2 · utility
9Cited by
8References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2013 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Jan 22, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/22
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Polishing pads having a polishing surface with continuous protrusions are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.