Compositions for cleaning III-V semiconductor materials and methods of using same
US9765288B2 · kind B2 · utility
0Cited by
73References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2013 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Dec 4, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Liquid compositions useful for the cleaning of residue and contaminants from a III-V microelectronic device material, such as InGaAs, without substantially removing the III-V material. The liquid compositions are improvements of the SC1 and SC2 formulations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.