Hsing-Chen Wu
9Patents
2h-index
15Co-inventors
40Inventor score
Filing activity: Dec 4, 2013 → May 12, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10651045B2 | Compositions and methods for etching silicon nitride-containing substrates | Electricity | 2 | Active |
| US11053440B2 | Silicon nitride etching composition and method | Electricity | 2 | Active |
| US11152219B2 | Selectively etching materials | Electricity | 0 | Active |
| US10290505B2 | Passivation of germanium surfaces | Electricity | 0 | Active |
| US10340150B2 | Ni:NiGe:Ge selective etch formulations and method of using same | Electricity | 0 | Active |
| US12129418B2 | Selective etchant compositions and methods | Chemistry; Metallurgy | 0 | Active |
| US11697767B2 | Silicon nitride etching composition and method | Electricity | 0 | Active |
| US9765288B2 | Compositions for cleaning III-V semiconductor materials and methods of using same | Chemistry; Metallurgy | 0 | Active |
| US11788007B2 | Method for removing hard masks | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.