Inventor · Baoshan, TW

Hsing-Chen Wu

9Patents
2h-index
15Co-inventors
40Inventor score

Filing activity: Dec 4, 2013 → May 12, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US10651045B2 Compositions and methods for etching silicon nitride-containing substrates Electricity 2 Active
US11053440B2 Silicon nitride etching composition and method Electricity 2 Active
US11152219B2 Selectively etching materials Electricity 0 Active
US10290505B2 Passivation of germanium surfaces Electricity 0 Active
US10340150B2 Ni:NiGe:Ge selective etch formulations and method of using same Electricity 0 Active
US12129418B2 Selective etchant compositions and methods Chemistry; Metallurgy 0 Active
US11697767B2 Silicon nitride etching composition and method Electricity 0 Active
US9765288B2 Compositions for cleaning III-V semiconductor materials and methods of using same Chemistry; Metallurgy 0 Active
US11788007B2 Method for removing hard masks Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.