Symmetric VHF source for a plasma reactor
US9824862B2 · kind B2 · utility
3Cited by
8References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2014 |
| Grant date | Nov 21, 2017 |
| Priority date | — |
| Expiry date | Apr 28, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32834
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.