Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
US9977351B2 · kind B2 · utility
0Cited by
8References
14Claims
0Family size
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Key dates
| Filing date | Jul 13, 2017 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Jul 13, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.