Alexander Kabansky
7Patents
4h-index
17Co-inventors
46Inventor score
Filing activity: Apr 24, 2015 → Feb 11, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9576811B2 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Electricity | 59 | Active |
| US9805941B2 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Electricity | 41 | Active |
| US10186426B2 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Electricity | 14 | Active |
| US10515816B2 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Electricity | 6 | Active |
| US10825680B2 | Directional deposition on patterned structures | Electricity | 3 | Active |
| US11521860B2 | Selectively etching for nanowires | Electricity | 0 | Active |
| US12027375B2 | Selective etch using a sacrificial mask | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.