Ardechir Pakfar
6Patents
2h-index
13Co-inventors
37Inventor score
Filing activity: Aug 1, 2013 → Oct 28, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9177874B2 | Method of forming a semiconductor device employing an optical planarization layer | Electricity | 4 | Active |
| US8815674B1 | Methods of forming a semiconductor device by performing a wet acid etching process while preventing or reducing loss of active area and/or isolation regions | Electricity | 4 | Active |
| US9972721B1 | Thick FDSOI source-drain improvement | Electricity | 1 | Active |
| US8906794B1 | Gate silicidation | Electricity | 1 | Active |
| US9184260B2 | Methods for fabricating integrated circuits with robust gate electrode structure protection | Electricity | 0 | Active |
| US9034746B2 | Gate silicidation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.