Inventor · Eagle, ID, US

Brian J. Coppa

15Patents
6h-index
22Co-inventors
62Inventor score

Filing activity: Jul 10, 2006 → Apr 27, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US10773282B2 Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy Electricity 37 Active
US10446453B2 Surface modification control for etch metric enhancement Physics 37 Active
US10304668B2 Localized process control using a plasma system Electricity 36 Active
US8852851B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 18 Active
US10333047B2 Electrical, mechanical, computing/ and/or other devices formed of extremely low resistance materials Emerging Cross-Sectional Technologies 15 Active
US8129289B2 Method to deposit conformal low temperature SiO2 Electricity 9 Active
US11289639B2 Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials Emerging Cross-Sectional Technologies 6 Active
US9761457B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 5 Active
US10096483B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 4 Active
US10607844B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 2 Active
US9305782B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 1 Active
US11335563B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 0 Active
US11935756B2 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Electricity 0 Active
US11273469B2 Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy Electricity 0 Active
US12063874B2 Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials Emerging Cross-Sectional Technologies 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.