Inventor · Changhua City, TW

Chih-Chien Wang

18Patents
4h-index
23Co-inventors
56Inventor score

Filing activity: Apr 17, 2012 → Jul 24, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9028915B2 Method of forming a photoresist layer Physics 104 Active
US9875892B2 Method of forming a photoresist layer Physics 57 Active
US8770797B2 Illumination device having heat dissipating means and light sensor Emerging Cross-Sectional Technologies 5 Active
US8940574B2 Metal grid in backside illumination image sensor chips and methods for forming the same Electricity 4 Active
US10121811B1 Method of high-aspect ratio pattern formation with submicron pixel pitch Electricity 3 Active
US10546889B2 Method of high-aspect ratio pattern formation with submicron pixel pitch Electricity 3 Active
US10090357B2 Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces Electricity 2 Active
US10186542B1 Patterning for substrate fabrication Physics 2 Active
US9153620B2 Method of fabricating a metal grid for semiconductor device Electricity 2 Active
US11769662B2 Method for reducing charging of semiconductor wafers Electricity 1 Active
US10734436B2 Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces Electricity 1 Active
US9285677B2 Lithography process on high topology features Physics 1 Active
US9040891B2 Image device and methods of forming the same Electricity 0 Active
US9791775B2 Lithography process on high topology features Physics 0 Active
US11529245B2 Kinematic-axis locating device for knee arthroplasty Human Necessities 0 Active
US9360755B2 Thickening phase for spin coating process Performing Operations; Transporting 0 Active
US12165867B2 Method for reducing charging of semiconductor wafers Electricity 0 Active
US11086221B2 Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.