Dimitris Lymberopoulos
12Patents
10h-index
10Co-inventors
61Inventor score
Filing activity: Mar 27, 1998 → Jan 14, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6455437B1 | Method and apparatus for monitoring the process state of a semiconductor device fabrication process | Electricity | 54 | Expired |
| US6368975B1 | Method and apparatus for monitoring a process by employing principal component analysis | Physics | 43 | Expired |
| US6521080B2 | Method and apparatus for monitoring a process by employing principal component analysis | Physics | 40 | Expired |
| US6413867B1 | Film thickness control using spectral interferometry | Electricity | 40 | Expired |
| US6085688A | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Electricity | 28 | Expired |
| US6247425A | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Electricity | 17 | Expired |
| US6625513B1 | Run-to-run control over semiconductor processing tool based upon mirror image target | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6589869B2 | Film thickness control using spectral interferometry | Electricity | 13 | Expired |
| US6895293B2 | Fault detection and virtual sensor methods for tool fault monitoring | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6896763B2 | Method and apparatus for monitoring a process by employing principal component analysis | Physics | 10 | Expired |
| US7265382B2 | Method and apparatus employing integrated metrology for improved dielectric etch efficiency | Electricity | 9 | Expired |
| US7006205B2 | Method and system for event detection in plasma processes | Electricity | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.