Inventor · Cupertino, CA, US

Donny Young

18Patents
4h-index
40Co-inventors
56Inventor score

Filing activity: Mar 8, 2002 → Aug 15, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US7674360B2 Mechanism for varying the spacing between sputter magnetron and target Electricity 6 Active
US7561015B2 Magnet secured in a two part shell Emerging Cross-Sectional Technologies 5 Active
US8790499B2 Process kit components for titanium sputtering chamber Electricity 4 Active
US6875927B2 High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications Electricity 4 Expired
US9534286B2 PVD target for self-centering process shield Emerging Cross-Sectional Technologies 4 Active
US8647485B2 Process kit shield for plasma enhanced processing chamber Emerging Cross-Sectional Technologies 2 Active
US8647484B2 Target for sputtering chamber Electricity 2 Active
US9123511B2 Process kit for RF physical vapor deposition Chemistry; Metallurgy 2 Active
US8668815B2 Process kit for RF physical vapor deposition Chemistry; Metallurgy 2 Active
US10763090B2 High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process Electricity 1 Active
US9303311B2 Substrate processing system with mechanically floating target assembly Electricity 1 Active
US8702918B2 Apparatus for enabling concentricity of plasma dark space Electricity 1 Active
US9343274B2 Process kit shield for plasma enhanced processing chamber Emerging Cross-Sectional Technologies 1 Active
US8795488B2 Apparatus for physical vapor deposition having centrally fed RF energy Electricity 1 Active
US9340866B2 Substrate support with radio frequency (RF) return path Electricity 0 Active
US9404174B2 Pinned target design for RF capacitive coupled plasma Electricity 0 Active
US9695502B2 Process kit with plasma-limiting gap Electricity 0 Active
US9255322B2 Substrate processing system having symmetric RF distribution and return paths Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.