Hartmut Rohrmann
6Patents
1h-index
14Co-inventors
44Inventor score
Filing activity: Dec 14, 2006 → Sep 16, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9587306B2 | Method for producing a directional layer by cathode sputtering, and device for implementing the method | Electricity | 11 | Active |
| US11952654B2 | Liquid sputter target | Electricity | 0 | Active |
| US11476099B2 | Methods of and apparatus for magnetron sputtering | Electricity | 0 | Active |
| US11551950B2 | Substrate processing apparatus and method of processing a substrate and of manufacturing a processed workpiece | Electricity | 0 | Active |
| US8540850B2 | Target arrangement for mounting / dismounting and method of manufacturing | Electricity | 0 | Active |
| US11848179B2 | Methods of and apparatus for magnetron sputtering | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.