Jie Yu
17Patents
10h-index
31Co-inventors
68Inventor score
Filing activity: Jun 28, 1999 → Oct 9, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6277683A | Method of forming a sidewall spacer and a salicide blocking shape, using only one silicon nitride layer | Electricity | 69 | Expired |
| US6277700A | High selective nitride spacer etch with high ratio of spacer width to deposited nitride thickness | Electricity | 40 | Expired |
| US6251764A | Method to form an L-shaped silicon nitride sidewall spacer | Electricity | 36 | Expired |
| US6228713A | Self-aligned floating gate for memory application using shallow trench isolation | Electricity | 31 | Expired |
| US6156598A | Method for forming a lightly doped source and drain structure using an L-shaped spacer | Electricity | 30 | Expired |
| US6355581B1 | Gas-phase additives for an enhancement of lateral etch component during high density plasma film deposition to improve film gap-fill capability | Electricity | 27 | Expired |
| US6316304A | Method of forming spacers of multiple widths | Electricity | 26 | Expired |
| US6211008A | Method for forming high-density high-capacity capacitor | Electricity | 14 | Expired |
| US6565718B1 | Magnetic recording medium with high density, thin dual carbon overcoats | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6303214A | Magnetic recording medium with high density thin dual carbon overcoats | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6468405B1 | Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6294480A | Method for forming an L-shaped spacer with a disposable organic top coating | Electricity | 10 | Expired |
| US6572958B1 | Magnetic recording media comprising a silicon carbide corrosion barrier layer and a c-overcoat | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6569294B1 | Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone | Emerging Cross-Sectional Technologies | 4 | Expired |
| US9988857B2 | Method for manufacturing superior 13Cr friction-welded drillrod | Chemistry; Metallurgy | 1 | Active |
| US10227828B2 | Ultra-high toughness and high strength drill pipe and manufacturing process thereof | Chemistry; Metallurgy | 0 | Active |
| US11162150B2 | Method for manufacturing superior 13Cr tool coupler | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.