Jinghao WANG
7Patents
1h-index
12Co-inventors
37Inventor score
Filing activity: Jun 21, 2021 → Jul 10, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11991876B2 | Method for forming a semiconductor structure having second isolation structures located between adjacent active areas | Electricity | 1 | Active |
| US11792974B2 | Semiconductor structure and manufacturing method thereof | Electricity | 0 | Active |
| US12063769B2 | Method for manufacturing a semiconductor structure using isolation layers for etching the trenches in a substrate | Electricity | 0 | Active |
| US12431363B2 | Method for fabricating contact structure and contact structure | Electricity | 0 | Active |
| US12148618B2 | Mask structure, semiconductor structure and methods for manufacturing same | Electricity | 0 | Active |
| USD1079664S1 | Mobile phone | General | 0 | Active |
| US12324147B2 | Method for forming semiconductor structure and semiconductor structure | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.