John R. Abelson
7Patents
4h-index
11Co-inventors
50Inventor score
Filing activity: Oct 31, 2006 → Nov 1, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7943527B2 | Surface preparation for thin film growth by enhanced nucleation | Electricity | 23 | Active |
| US8362220B2 | Metal complex compositions and methods for making metal-containing films | Electricity | 14 | Active |
| US8110503B2 | Surface preparation for thin film growth by enhanced nucleation | Electricity | 11 | Active |
| US7592254B2 | Methods for coating and filling high aspect ratio recessed features | Electricity | 8 | Active |
| US10103057B2 | Use of an inhibitor molecule in chemical vapor deposition to afford deposition of copper on a metal substrate with no deposition on adjacent SIO2 substrate | Electricity | 4 | Active |
| US8846146B2 | Smoothing agents to enhance nucleation density in thin film chemical vapor deposition | Chemistry; Metallurgy | 2 | Active |
| US11584986B1 | Area selective CVD of metallic films using precursor gases and inhibitors | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.