Kimihiro Higuchi
15Patents
8h-index
29Co-inventors
72Inventor score
Filing activity: Mar 3, 1995 → Dec 5, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5980767A | Method and devices for detecting the end point of plasma process | Performing Operations; Transporting | 70 | Expired |
| US8056503B2 | Plasma procesor and plasma processing method | Electricity | 38 | Expired |
| US6676804B1 | Method and apparatus for plasma processing | Emerging Cross-Sectional Technologies | 34 | Expired |
| US5783492A | Plasma processing method, plasma processing apparatus, and plasma generating apparatus | Chemistry; Metallurgy | 31 | Expired |
| US8387562B2 | Plasma processor and plasma processing method | Electricity | 15 | Active |
| US7713431B2 | Plasma processing method | Electricity | 13 | Expired |
| US8904957B2 | Plasma processor and plasma processing method | Electricity | 10 | Active |
| US9437402B2 | Plasma processor and plasma processing method | Electricity | 9 | Active |
| US7335278B2 | Plasma processing apparatus and plasma processing method | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7465673B2 | Method and apparatus for bilayer photoresist dry development | Physics | 4 | Expired |
| US7799238B2 | Plasma processing method and plasma processing apparatus | Electricity | 3 | Active |
| US9728381B2 | Plasma processor and plasma processing method | Electricity | 2 | Active |
| US7541283B2 | Plasma processing method and plasma processing apparatus | Electricity | 2 | Expired |
| US8287750B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US8343372B2 | Surface processing method for mounting stage | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.