Kirk Ostrowski
7Patents
4h-index
23Co-inventors
53Inventor score
Filing activity: Sep 20, 2002 → Jun 30, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6693043B1 | Method for removing photoresist from low-k films in a downstream plasma system | Electricity | 26 | Expired |
| US8129281B1 | Plasma based photoresist removal system for cleaning post ash residue | Electricity | 22 | Active |
| US8591661B2 | Low damage photoresist strip method for low-K dielectrics | Electricity | 7 | Active |
| US8716143B1 | Plasma based photoresist removal system for cleaning post ash residue | Electricity | 5 | Active |
| US11062897B2 | Metal doped carbon based hard mask removal in semiconductor fabrication | Electricity | 2 | Active |
| US9564344B2 | Ultra low silicon loss high dose implant strip | Electricity | 2 | Active |
| US9613825B2 | Photoresist strip processes for improved device integrity | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.