Klaus Roithner
8Patents
6h-index
16Co-inventors
49Inventor score
Filing activity: Mar 13, 1995 → Dec 10, 1998
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6294026A | Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops | Chemistry; Metallurgy | 33 | Expired |
| US5605600A | Etch profile shaping through wafer temperature control | Electricity | 31 | Expired |
| US5776808A | Pad stack with a poly SI etch stop for TEOS mask removal with RIE | Electricity | 29 | Expired |
| US6537418B1 | Spatially uniform gas supply and pump configuration for large wafer diameters | Electricity | 25 | Expired |
| US6190955A | Fabrication of trench capacitors using disposable hard mask | Electricity | 15 | Expired |
| US5592412A | Enhanced deep trench storage node capacitance for DRAM | Electricity | 8 | Expired |
| US6066570A | Method and apparatus for preventing formation of black silicon on edges of wafers | Electricity | 2 | Expired |
| US5961723A | Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops | General | 0 | Revoked |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.