Li Chun Te
12Patents
2h-index
14Co-inventors
43Inventor score
Filing activity: Apr 20, 2017 → Apr 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10304677B2 | Low-k feature formation processes and structures formed thereby | Electricity | 3 | Active |
| US10707165B2 | Semiconductor device having an extra low-k dielectric layer and method of forming the same | Electricity | 2 | Active |
| US10833170B2 | Low-k gate spacer and methods for forming the same | Electricity | 1 | Active |
| US11417602B2 | Semiconductor device having an extra low-k dielectric layer and method of forming the same | Electricity | 0 | Active |
| US11855182B2 | Low-k gate spacer and methods for forming the same | Electricity | 0 | Active |
| US10950431B2 | Low-k feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US11295948B2 | Low-K feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US11062901B2 | Low-k dielectric and processes for forming same | Electricity | 0 | Active |
| US10490650B2 | Low-k gate spacer and methods for forming the same | Electricity | 0 | Active |
| US10910216B2 | Low-k dielectric and processes for forming same | Electricity | 0 | Active |
| US11705327B2 | Low-k feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US12424438B2 | Low-k dielectric and processes for forming same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.