Mahito Sawada
12Patents
5h-index
18Co-inventors
59Inventor score
Filing activity: Jul 12, 1999 → Feb 4, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6213852A | Polishing apparatus and method of manufacturing a semiconductor device using the same | Performing Operations; Transporting | 13 | Expired |
| US6579787B2 | Semiconductor device with a fluorinated silicate glass film as an interlayer metal dielectric film, and manufacturing method thereof | Electricity | 13 | Expired |
| US6645859B1 | Semiconductor device and manufacturing method thereof | Electricity | 8 | Expired |
| US7154184B2 | Interconnection structure of semiconductor device | Electricity | 7 | Expired |
| US8384187B2 | Semiconductor device with shallow trench isolation | Electricity | 6 | Active |
| US6544904B1 | Method of manufacturing semiconductor device | Electricity | 4 | Expired |
| US7012336B2 | Semiconductor device with a fluorinated silicate glass film as an interlayer metal dielectric film, and manufacturing method thereof | Electricity | 2 | Expired |
| US7875539B2 | Semiconductor device | Electricity | 2 | Active |
| US8084343B2 | Semiconductor device | Electricity | 1 | Active |
| US6759317B2 | Method of manufacturing semiconductor device having passivation film and buffer coating film | Electricity | 0 | Expired |
| US9029237B2 | Semiconductor device and method of manufacturing the same | Electricity | 0 | Active |
| US7489040B2 | Interconnection structure of semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.