Inventor · 流花街道, CN

Maolin Long

63Patents
8h-index
32Co-inventors
78Inventor score

Filing activity: May 4, 2001 → Jun 17, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9583357B1 Systems and methods for reverse pulsing Electricity 90 Active
US9761459B2 Systems and methods for reverse pulsing Electricity 85 Active
US9515633B1 Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers Electricity 38 Active
US6811651B2 Gas temperature control for a plasma process Chemistry; Metallurgy 34 Expired
US9059678B2 TCCT match circuit for plasma etch chambers Electricity 24 Active
US6916401B2 Adjustable segmented electrode apparatus and method Electricity 21 Expired
US10264663B1 Matchless plasma source for semiconductor wafer fabrication Electricity 13 Active
US7776156B2 Side RF coil and side heater for plasma processing apparatus Electricity 9 Active
US10638593B2 Matchless plasma source for semiconductor wafer fabrication Electricity 6 Active
US10515781B1 Direct drive RF circuit for substrate processing systems Electricity 6 Active
US9966236B2 Powered grid for plasma chamber Electricity 6 Active
US7531061B2 Gas temperature control for a plasma process Chemistry; Metallurgy 5 Expired
US10121641B2 Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems Electricity 5 Active
US7782979B2 Base-band digital pre-distortion-based method for improving efficiency of RF power amplifier Electricity 5 Expired
US10784083B2 RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support Electricity 5 Active
US10847345B2 Direct drive RF circuit for substrate processing systems Electricity 4 Active
US9293353B2 Faraday shield having plasma density decoupling structure between TCP coil zones Electricity 4 Active
US9490106B2 Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil Electricity 3 Active
US7091503B2 Measuring plasma uniformity in-situ at wafer level Electricity 3 Expired
US9384948B2 Hammerhead TCP coil support for high RF power conductor etch systems Electricity 2 Active
US10672590B2 Frequency tuning for a matchless plasma source Electricity 2 Active
US11716805B2 Matchless plasma source for semiconductor wafer fabrication Electricity 2 Active
US10332725B2 Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network Electricity 2 Active
US9305750B2 Adjusting current ratios in inductively coupled plasma processing systems Electricity 2 Active
US8736175B2 Current control in plasma processing systems Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.