Marco Tortonese
19Patents
9h-index
20Co-inventors
72Inventor score
Filing activity: Oct 27, 1988 → Aug 1, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5345815A | Atomic force microscope having cantilever with piezoresistive deflection sensor | Emerging Cross-Sectional Technologies | 81 | Expired |
| US5444244A | Piezoresistive cantilever with integral tip for scanning probe microscope | Emerging Cross-Sectional Technologies | 62 | Expired |
| US5066358A | Nitride cantilevers with single crystal silicon tips | Physics | 51 | Expired |
| US5483822A | Cantilever and method of using same to detect features on a surface | Emerging Cross-Sectional Technologies | 31 | Expired |
| US5952657A | Atomic force microscope with integrated optics for attachment to optical microscope | Emerging Cross-Sectional Technologies | 28 | Expired |
| US5595942A | Method of fabricating cantilever for atomic force microscope having piezoresistive deflection detector | Emerging Cross-Sectional Technologies | 28 | Expired |
| US5861624A | Atomic force microscope for attachment to optical microscope | Emerging Cross-Sectional Technologies | 16 | Expired |
| US9211403B2 | Steerable stylet | Human Necessities | 13 | Active |
| US6646737B2 | Submicron dimensional calibration standards and methods of manufacture and use | Electricity | 13 | Expired |
| US7372016B1 | Calibration standard for a dual beam (FIB/SEM) machine | Electricity | 8 | Expired |
| US8245161B1 | Verification of computer simulation of photolithographic process | Physics | 8 | Active |
| US7301638B1 | Dimensional calibration standards | Physics | 5 | Expired |
| US7453571B1 | Dimensional calibration standards | Physics | 3 | Active |
| US6005251A | Voice coil scanner for use in scanning probe microscope | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7576317B1 | Calibration standard for a dual beam (FIB/SEM) machine | Electricity | 2 | Active |
| US6821812B1 | Structure and method for mounting a small sample in an opening in a larger substrate | Electricity | 0 | Expired |
| US8943443B1 | Verification of computer simulation of photolithographic process | Physics | 0 | Active |
| US5866902A | Atomic force microscope with integrated optics for attachment to optical microscope | General | 0 | Revoked |
| US7423264B2 | Atomic force microscope | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.