Miyako Matsui
10Patents
4h-index
26Co-inventors
60Inventor score
Filing activity: Aug 14, 1997 → Jun 16, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5981399A | Method and apparatus for fabricating semiconductor devices | Electricity | 67 | Expired |
| US6700122B2 | Wafer inspection system and wafer inspection process using charged particle beam | Electricity | 46 | Expired |
| US6753524B2 | Inspection system and inspection process for wafer with circuit using charged-particle beam | Electricity | 13 | Expired |
| US7368713B2 | Method and apparatus for inspecting semiconductor device | Electricity | 4 | Expired |
| US10665516B2 | Etching method and plasma processing apparatus | Electricity | 3 | Active |
| US9702695B2 | Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof | Emerging Cross-Sectional Technologies | 2 | Active |
| US10971369B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US11462416B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US10622269B2 | Etching method and plasma processing apparatus | General | 0 | Revoked |
| US11875978B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.