Patrick Reilly
15Patents
5h-index
37Co-inventors
62Inventor score
Filing activity: May 28, 2010 → Feb 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9157730B2 | PECVD process | Physics | 46 | Active |
| US9721784B2 | Ultra-conformal carbon film deposition | Electricity | 23 | Active |
| US9458537B2 | PECVD process | Physics | 8 | Active |
| US9816187B2 | PECVD process | Physics | 7 | Active |
| US8679987B2 | Deposition of an amorphous carbon layer with high film density and high etch selectivity | Electricity | 6 | Active |
| US10074534B2 | Ultra-conformal carbon film deposition | Electricity | 5 | Active |
| US8778813B2 | Confined process volume PECVD chamber | Electricity | 4 | Active |
| US10793954B2 | PECVD process | Physics | 2 | Active |
| US10060032B2 | PECVD process | Physics | 2 | Active |
| US8513129B2 | Planarizing etch hardmask to increase pattern density and aspect ratio | Electricity | 1 | Active |
| US9748093B2 | Pulsed nitride encapsulation | Electricity | 1 | Active |
| US10030306B2 | PECVD apparatus and process | Physics | 1 | Active |
| US11613812B2 | PECVD process | Physics | 1 | Active |
| US9646818B2 | Method of forming planar carbon layer by applying plasma power to a combination of hydrocarbon precursor and hydrogen-containing precursor | Electricity | 0 | Active |
| US11898249B2 | PECVD process | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.