Shao-Wen Hsia
6Patents
4h-index
6Co-inventors
46Inventor score
Filing activity: Jun 8, 1992 → Sep 19, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5314772A | High resolution, multi-layer resist for microlithography and method therefor | Physics | 260 | Expired |
| US6291361A | Method and apparatus for high-resolution in-situ plasma etching of inorganic and metal films | Electricity | 10 | Expired |
| US6383821B1 | Semiconductor device and process | Electricity | 9 | Expired |
| US6251568A | Methods and apparatus for stripping photoresist and polymer layers from a semiconductor stack in a non-corrosive environment | Electricity | 8 | Expired |
| US6798065B2 | Method and apparatus for high-resolution in-situ plasma etching of inorganic and metals films | Electricity | 2 | Expired |
| US6328848A | Apparatus for high-resolution in-situ plasma etching of inorganic and metal films | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.