Inventor · Toyama, JP

Toru Kakuda

8Patents
2h-index
12Co-inventors
44Inventor score

Filing activity: Nov 29, 2011 → Jul 14, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US9911580B2 Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus Electricity 3 Active
US10763084B2 Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus Electricity 2 Active
US9793112B2 Method of manufacturing semiconductor device and non-transitory computer-readable recording medium Electricity 1 Active
US12087598B2 Substrate processing apparatus Electricity 1 Active
US11101111B2 Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus Electricity 1 Active
US11948778B2 Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus Electricity 0 Active
US11168396B2 Method of manufacturing semiconductor device and recording medium Electricity 0 Active
US10985017B2 Method of manufacturing semiconductor device and non-transitory computer-readable recording medium Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.