Inventor · Radeberg, DE

Vivien Schroeder

7Patents
3h-index
14Co-inventors
43Inventor score

Filing activity: May 21, 2010 → Sep 21, 2012

Most-cited inventions

PatentTitleAreaCited byStatus
US8247281B2 Technique for exposing a placeholder material in a replacement gate approach by modifying a removal rate of stressed dielectric overlayers Electricity 9 Active
US8679924B2 Self-aligned multiple gate transistor formed on a bulk substrate Electricity 6 Active
US8298894B2 Work function adjustment in high-k metal gate electrode structures by selectively removing a barrier layer Electricity 5 Active
US8440559B2 Work function adjustment in high-K metal gate electrode structures by selectively removing a barrier layer Electricity 2 Active
US8790975B2 Semiconductor device comprising a capacitor formed in the metallization system based on dummy metal features Electricity 2 Active
US8883586B2 Mol insitu Pt rework sequence Electricity 0 Active
US8357575B2 Technique for exposing a placeholder material in a replacement gate approach by modifying a removal rate of stressed dielectric overlayers Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.