Vivien Schroeder
7Patents
3h-index
14Co-inventors
43Inventor score
Filing activity: May 21, 2010 → Sep 21, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8247281B2 | Technique for exposing a placeholder material in a replacement gate approach by modifying a removal rate of stressed dielectric overlayers | Electricity | 9 | Active |
| US8679924B2 | Self-aligned multiple gate transistor formed on a bulk substrate | Electricity | 6 | Active |
| US8298894B2 | Work function adjustment in high-k metal gate electrode structures by selectively removing a barrier layer | Electricity | 5 | Active |
| US8440559B2 | Work function adjustment in high-K metal gate electrode structures by selectively removing a barrier layer | Electricity | 2 | Active |
| US8790975B2 | Semiconductor device comprising a capacitor formed in the metallization system based on dummy metal features | Electricity | 2 | Active |
| US8883586B2 | Mol insitu Pt rework sequence | Electricity | 0 | Active |
| US8357575B2 | Technique for exposing a placeholder material in a replacement gate approach by modifying a removal rate of stressed dielectric overlayers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.