Wei E. Wu
9Patents
4h-index
18Co-inventors
46Inventor score
Filing activity: Jun 3, 1997 → Jul 14, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6171910A | Method for forming a semiconductor device | Electricity | 155 | Expired |
| US6902969B2 | Process for forming dual metal gate structures | Electricity | 55 | Expired |
| US6146948A | Method for manufacturing a thin oxide for use in semiconductor integrated circuits | Electricity | 31 | Expired |
| US6232134A | Method and apparatus for monitoring wafer characteristics and/or semiconductor processing consistency using wafer charge distribution measurements | Electricity | 28 | Expired |
| US6969568B2 | Method for etching a quartz layer in a photoresistless semiconductor mask | Electricity | 2 | Expired |
| US6818362B1 | Photolithography reticle design | Physics | 1 | Expired |
| US7732102B2 | Cr-capped chromeless phase lithography | Physics | 0 | Active |
| US6797440B2 | Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device | Physics | 0 | Expired |
| US7018747B2 | Photomask having line end phase anchors | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.