Wei-Long Wang
9Patents
4h-index
34Co-inventors
49Inventor score
Filing activity: Feb 9, 2010 → Sep 27, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8943445B2 | Method of merging color sets of layout | Physics | 28 | Active |
| US8381153B2 | Dissection splitting with optical proximity correction and mask rule check enforcement | Emerging Cross-Sectional Technologies | 19 | Active |
| US8631379B2 | Decomposing integrated circuit layout | Physics | 18 | Active |
| US8378319B2 | System and method for generating direct-write pattern | Physics | 4 | Active |
| US9208275B2 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Electricity | 3 | Active |
| US9122160B2 | Method and apparatus for performing optical proximity and photomask correction | Emerging Cross-Sectional Technologies | 1 | Active |
| US9305800B2 | Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features | Electricity | 1 | Active |
| US9286434B2 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patterns | Electricity | 1 | Active |
| US10055535B2 | Method, system and program product for identifying anomalies in integrated circuit design layouts | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.