Thermal processing susceptor

US10062598B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Anhthu Ngo · San Jose, US
• Zuoming ZHU · Sunnyvale, US
• Balasubramanian Ramachandran · Santa Clara, US
• Paul Brillhart · Pleasanton, US
• Edric Tong · Sunnyvale, US
• Anzhong Chang · San Jose, US
• Kin Pong Lo · Fremont, US
• Kartik Shah · Saratoga, US
• Schubert S. Chu · San Francisco, US
• Zhepeng CONG · San Jose, US
• James Francis Mack · Palo Alto, US
• Nyi O. Myo · San Jose, US
• Kevin Joseph Bautista · San Jose, US
• Xuebin Li · Santa Clara, US
• Yi-Chiau Huang · Fremont, US
• Zhiyuan Ye · San Jose, US

Key dates

• Filing date: Apr 28, 2015
• Grant date: Aug 28, 2018
• Expiry date: May 15, 2036

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4585
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.