Zuoming ZHU
19Patents
3h-index
51Co-inventors
59Inventor score
Filing activity: Sep 22, 2010 → Dec 14, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10062598B2 | Thermal processing susceptor | Chemistry; Metallurgy | 4 | Active |
| US9768043B2 | Quartz upper and lower domes | Chemistry; Metallurgy | 4 | Active |
| US11177144B2 | Wafer spot heating with beam width modulation | Performing Operations; Transporting | 4 | Active |
| US11021795B2 | Multi zone spot heating in epi | Electricity | 3 | Active |
| US11821088B2 | Multi zone spot heating in EPI | Electricity | 2 | Active |
| US10930543B2 | Thermal processing susceptor | Chemistry; Metallurgy | 2 | Active |
| US9127360B2 | Epitaxial chamber with cross flow | Electricity | 1 | Active |
| US10770319B2 | EPI thickness tuning by pulse or profile spot heating | Electricity | 1 | Active |
| US12163229B2 | Multi zone spot heating in EPI | Electricity | 1 | Active |
| US9842753B2 | Absorbing lamphead face | Electricity | 1 | Active |
| US11860973B2 | Method and system for foreline deposition diagnostics and control | Performing Operations; Transporting | 0 | Active |
| US12196617B2 | Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber | Electricity | 0 | Active |
| US11261538B1 | In-situ temperature mapping for epi chamber | Electricity | 0 | Active |
| US12334341B2 | Chamber body feedthrough for in chamber resistive heating element | Electricity | 0 | Active |
| US12165934B2 | Substrate processing monitoring | Electricity | 0 | Active |
| US11848226B2 | Thermal processing susceptor | Chemistry; Metallurgy | 0 | Active |
| US12400904B2 | Thermal processing susceptor | Chemistry; Metallurgy | 0 | Active |
| US12428731B2 | Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability | Chemistry; Metallurgy | 0 | Active |
| US11733081B2 | Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.