Illumination system for microlithography

US10088754B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Axel Scholz · Aalen, DE
• Frank Schlesener · Oberkochen, DE
• Nils Haverkamp · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Michael Gerhard · Aalen, DE
• Gerhard-Wilhelm Ziegler · Aalen, DE
• Mirco Kern · Eppelheim, DE
• Thomas C. Bischoff · Buxtehude, DE
• Thomas Stammler · Aalen, DE
• Stephan Kellner · Lauchheim, DE
• Manfred Maul · Aalen, DE
• Daniel Walldorf · Frankfurt, DE
• Igor Hurevich · Riegelsberg, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Mar 21, 2017
• Grant date: Oct 2, 2018
• Expiry date: Mar 21, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.