Microlithography projection objective

US10281824B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Heiko Feldmann · Aalen, DE
• Daniel Kraehmer · Aalen, DE
• Jean-Claude Perrin · Saint-Cloud, FR
• Julian Kaller · Oberkochen, DE
• Aurelian Dodoc · Heidenheim an der Brenz, DE
• Vladimir Kamenov · Oberkochen, DE
• Olaf Conradi · Sonthofen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Thomas Okon · Aalen, DE
• Alexander Epple · Aalen, DE

Key dates

• Filing date: Jan 24, 2017
• Grant date: May 7, 2019
• Expiry date: Jan 24, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70941
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.