Compositions and methods for selectively etching titanium nitride

US10392560B2 · kind B2 · utility

Assignee

• ENTEGRIS, INC. · US

Inventors

• Jeffrey A. Barnes · New Milford, US
• Emanuel I. Cooper · Scarsdale, US
• Li-Min Chen · Norwalk, US
• Steven Lippy · Danbury, US
• Rekha Rajaram · Scarsdale, US
• Sheng-Hung Tu · Sanwan, TW

Key dates

• Filing date: Jan 17, 2017
• Grant date: Aug 27, 2019
• Expiry date: Jan 20, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/31144
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.