Steven Lippy
14Patents
4h-index
24Co-inventors
56Inventor score
Filing activity: Mar 13, 2006 → Apr 14, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9063431B2 | Aqueous cleaner for the removal of post-etch residues | Chemistry; Metallurgy | 17 | Active |
| US9831088B2 | Composition and process for selectively etching metal nitrides | Electricity | 9 | Active |
| US10138117B2 | Aqueous formulations for removing metal hard mask and post-etch residue with Cu/W compatibility | Electricity | 8 | Active |
| US9546321B2 | Compositions and methods for selectively etching titanium nitride | Electricity | 4 | Active |
| US10472567B2 | Compositions and methods for selectively etching titanium nitride | Electricity | 3 | Active |
| US10428271B2 | Compositions and methods for selectively etching titanium nitride | Electricity | 3 | Active |
| US10392560B2 | Compositions and methods for selectively etching titanium nitride | Electricity | 2 | Active |
| US8044009B2 | Compositions for cleaning ion implanted photoresist in front end of line applications | Chemistry; Metallurgy | 2 | Active |
| US10920141B2 | Compositions and methods for selectively etching titanium nitride | Electricity | 1 | Active |
| US11978622B2 | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility | Chemistry; Metallurgy | 0 | Active |
| US10460954B2 | Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility | Chemistry; Metallurgy | 0 | Active |
| US11492709B2 | Method and composition for etching molybdenum | Electricity | 0 | Active |
| US11346008B2 | Ruthenium etching composition and method | Chemistry; Metallurgy | 0 | Active |
| US11476158B2 | Cobalt deposition selectivity on copper and dielectrics | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.