Inventor · New Milford, CT, US

Jeffrey A. Barnes

16Patents
7h-index
33Co-inventors
62Inventor score

Filing activity: Mar 30, 2005 → May 4, 2018

Most-cited inventions

PatentTitleAreaCited byStatus
US7365045B2 Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide Chemistry; Metallurgy 27 Expired
US9074170B2 Copper cleaning and protection formulations Chemistry; Metallurgy 20 Active
US8685909B2 Antioxidants for post-CMP cleaning formulations Chemistry; Metallurgy 19 Active
US9063431B2 Aqueous cleaner for the removal of post-etch residues Chemistry; Metallurgy 17 Active
US8754021B2 Non-amine post-CMP composition and method of use Chemistry; Metallurgy 15 Active
US7922823B2 Compositions for processing of semiconductor substrates Chemistry; Metallurgy 11 Active
US9831088B2 Composition and process for selectively etching metal nitrides Electricity 9 Active
US10176979B2 Post-CMP removal using compositions and method of use Chemistry; Metallurgy 7 Active
US9546321B2 Compositions and methods for selectively etching titanium nitride Electricity 4 Active
US9528078B2 Antioxidants for post-CMP cleaning formulations Chemistry; Metallurgy 2 Active
US10392560B2 Compositions and methods for selectively etching titanium nitride Electricity 2 Active
US10557107B2 Post chemical mechanical polishing formulations and method of use Chemistry; Metallurgy 1 Active
USRE46427E1 Antioxidants for post-CMP cleaning formulations General 1 Active
US10347504B2 Use of non-oxidizing strong acids for the removal of ion-implanted resist Electricity 0 Active
US10340150B2 Ni:NiGe:Ge selective etch formulations and method of using same Electricity 0 Active
US9340760B2 Non-amine post-CMP composition and method of use Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.