Pellicle and pellicle assembly
US10983431B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignees
Inventors
- David Ferdinand Vles
- Erik Achilles Abegg
- Aage Bendiksen
- Derk Servatius Gertruda Brouns
- Pradeep K. Govil
- Paul Janssen
- Maxim Aleksandrovich Nasalevich
- Arnoud Willem Notenboom
- Mária Péter
- Marcus Adrianus Van De Kerkhof
- Willem Joan Van Der Zande
- Pieter-Jan Van Zwol
- Johannes Petrus Martinus Bernardus Vermeulen
- Willem-Pieter Voorthuijzen
- James Wiley
Key dates
| Filing date | Oct 30, 2019 |
| Grant date | Apr 20, 2021 |
| Priority date | — |
| Expiry date | Oct 30, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.