Gas abatement apparatus

US11110383B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Adib Khan · Santa Clara, US
• Qiwei Liang · Fremont, US
• Sultan Malik · Sacramento, US
• Srinivas D. Nemani · Sunnyvale, US
• Rafika Smati · Santa Clara, US
• Joseph Ng · Santa Clara, US
• John O'Hehir · Santa Clara, US

Key dates

• Filing date: Jun 9, 2020
• Grant date: Sep 7, 2021
• Expiry date: Jun 9, 2040

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01D2258/0216
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.