Adib Khan
27Patents
8h-index
25Co-inventors
71Inventor score
Filing activity: Jul 15, 2010 → Nov 29, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8894767B2 | Flow control features of CVD chambers | Emerging Cross-Sectional Technologies | 105 | Active |
| US10179941B1 | Gas delivery system for high pressure processing chamber | Electricity | 27 | Active |
| US10675581B2 | Gas abatement apparatus | Performing Operations; Transporting | 18 | Active |
| US10720341B2 | Gas delivery system for high pressure processing chamber | Electricity | 18 | Active |
| US10529603B2 | High pressure wafer processing systems and related methods | Electricity | 17 | Active |
| US10224224B2 | High pressure wafer processing systems and related methods | Electricity | 17 | Active |
| US10748783B2 | Gas delivery module | Electricity | 16 | Active |
| US10358715B2 | Integrated cluster tool for selective area deposition | Electricity | 11 | Active |
| US10704141B2 | In-situ CVD and ALD coating of chamber to control metal contamination | Electricity | 6 | Active |
| US9285168B2 | Module for ozone cure and post-cure moisture treatment | Electricity | 2 | Active |
| US10113236B2 | Batch curing chamber with gas distribution and individual pumping | Electricity | 2 | Active |
| US10550472B2 | Flow control features of CVD chambers | Emerging Cross-Sectional Technologies | 2 | Active |
| US10947621B2 | Low vapor pressure chemical delivery | Chemistry; Metallurgy | 1 | Active |
| US11066747B2 | Chemical delivery chamber for self-assembled monolayer processes | Performing Operations; Transporting | 1 | Active |
| US11110383B2 | Gas abatement apparatus | Performing Operations; Transporting | 0 | Active |
| US12203171B2 | Batch curing chamber with gas distribution and individual pumping | Electricity | 0 | Active |
| US11725274B2 | Integrated cluster tool for selective area deposition | Electricity | 0 | Active |
| US11361978B2 | Gas delivery module | Electricity | 0 | Active |
| US12146219B2 | Flow control features of CVD chambers | Emerging Cross-Sectional Technologies | 0 | Active |
| US12198951B2 | High pressure wafer processing systems and related methods | Electricity | 0 | Active |
| US8524004B2 | Loadlock batch ozone cure | Electricity | 0 | Active |
| US11408075B2 | Batch curing chamber with gas distribution and individual pumping | Electricity | 0 | Active |
| USD941787S1 | Substrate transfer blade | General | 0 | Active |
| US11749555B2 | Semiconductor processing system | Electricity | 0 | Active |
| US11948828B2 | Pin-less substrate transfer apparatus and method for a processing chamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.