Plasma reactor with highly symmetrical four-fold gas injection
US11244811B2 · kind B2 · utility
1Cited by
30References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2018 |
| Grant date | Feb 8, 2022 |
| Priority date | — |
| Expiry date | Mar 9, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.