Patent · US Active

Thermal processing susceptor

US11848226B2 · kind B2 · utility

0Cited by

22References

7Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Anhthu Ngo · San Jose, US
Zuoming ZHU · Sunnyvale, US
Balasubramanian Ramachandran · Santa Clara, US
Paul Brillhart · Pleasanton, US
Edric Tong · Sunnyvale, US
Anzhong Chang · San Jose, US
Kin Pong Lo · Fremont, US
Kartik Shah · Saratoga, US
Schubert S. Chu · San Francisco, US
Zhepeng CONG · San Jose, US
James Francis Mack · Palo Alto, US
Nyi O. Myo · San Jose, US
Kevin Joseph Bautista · San Jose, US
Xuebin Li · Santa Clara, US
Yi-Chiau Huang · Fremont, US
Zhiyuan Ye · San Jose, US

Key dates

Filing date	Feb 23, 2021
Grant date	Dec 19, 2023
Priority date	—
Expiry date	Dec 20, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/4585
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.