Pedestal for substrate processing chambers
US12000048B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2023 |
| Grant date | Jun 4, 2024 |
| Priority date | — |
| Expiry date | Feb 20, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32715
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Aspects of the present disclosure relate generally to pedestals, components thereof, and methods of using the same for substrate processing chambers. In one implementation, a pedestal for disposition in a substrate processing chamber includes a body. The body includes a support surface. The body also includes a stepped surface that protrudes upwards from the support surface. The stepped surface is disposed about the support surface to surround the support surface. The stepped surface defines an edge ring such that the edge ring is integrated with the pedestal to form the body that is monolithic. The pedestal also includes an electrode disposed in the body, and one or more heaters disposed in the body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.