Inventor · Palo Alto, CA, US

Sungwon Ha

18Patents
4h-index
53Co-inventors
63Inventor score

Filing activity: Jan 29, 2002 → May 26, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US7099273B2 Data transport acceleration and management within a network communication system Emerging Cross-Sectional Technologies 59 Expired
US7136353B2 Quality of service management for multiple connections within a network communication system Electricity 52 Expired
US7145913B2 Thread based scalable routing for an active router Electricity 11 Expired
US10403535B2 Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system Electricity 7 Active
US11670492B2 Chamber configurations and processes for particle control Electricity 4 Active
US10100408B2 Edge hump reduction faceplate by plasma modulation Electricity 3 Active
US10580623B2 Plasma processing using multiple radio frequency power feeds for improved uniformity Electricity 3 Active
US11600470B2 Targeted heat control systems Electricity 1 Active
US11584994B2 Pedestal for substrate processing chambers Electricity 1 Active
US12136549B2 Plasma-enhanced chemical vapor deposition of carbon hard-mask Electricity 0 Active
US12000048B2 Pedestal for substrate processing chambers Electricity 0 Active
US11276562B2 Plasma processing using multiple radio frequency power feeds for improved uniformity Electricity 0 Active
US12211673B2 Processing chamber deposition confinement Electricity 0 Active
US11875969B2 Process chamber with reduced plasma arc Electricity 0 Active
US12400843B2 Chamber configurations and processes for particle control Electricity 0 Active
US11515129B2 Radiation shield modification for improving substrate temperature uniformity Electricity 0 Active
US11699577B2 Treatment for high-temperature cleans Electricity 0 Active
US12191169B2 Systems and methods for faceplate temperature control Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.