Single crystal metal oxide plasma chamber component
US12249490B2 · kind B2 · utility
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5References
11Claims
0Family size
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Key dates
| Filing date | Oct 21, 2020 |
| Grant date | Mar 11, 2025 |
| Priority date | — |
| Expiry date | Jul 4, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.