Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

US6077384A · kind A · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kenneth S. Collins · San Jose, US
• Michael R. Rice · Pleasanton, US
• John Trow · San Jose, US
• Douglas A. Buchberger, Jr. · Livermore, US
• Eric Askarinam · Sunnyvale, US
• Joshua Chiu-Wing Tsui · Santa Clara, US
• David W. Groechel · Los Altos Hills, US
• Raymond Hung · Palo Alto, US

Key dates

• Filing date: Feb 2, 1996
• Grant date: Jun 20, 2000
• Expiry date: Feb 2, 2016

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3346
• WIPO field: Food chemistry
• WIPO sector: Chemistry

Abstract

The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor window, a base within the chamber for supporting the workpiece during processing thereof, a gas inlet system for admitting a plasma precursor gas into the chamber, and an inductive antenna adjacent a side of the semiconductor window opposite the base for coupling power into the interior of the chamber through the semiconductor window electrode.