Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

US6623596B1 · kind B1 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kenneth S. Collins · San Jose, US
• Michael R. Rice · Pleasanton, US
• John Trow · San Jose, US
• Douglas A. Buchberger, Jr. · Livermore, US
• Eric Askarinam · Sunnyvale, US
• Joshua Chiu-Wing Tsui · Santa Clara, US
• David W. Groechel · Los Altos Hills, US
• Raymond Hung · Palo Alto, US

Key dates

• Filing date: Mar 13, 2000
• Grant date: Sep 23, 2003
• Expiry date: Mar 13, 2020

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3346
• WIPO field: Food chemistry
• WIPO sector: Chemistry

Abstract

A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.