Collector for EUV light source
US7217940B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2004 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Mar 27, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.